Product Info Sheet
Nanoimprint Lithography Formulations
Revolutionize the performance capabilities of your Extended Reality (XR) and Optical Sensor applications with Pixelligent’s PixNIL® formulations.
PixNIL® High-Index NIL Formulations
PixNIL® formulations are high-refractive-index resins and are available in solvent-containing variations with a range of refractive indices and UV stability to meet a broad range of requirements. PixNIL® products deliver nanoimprinted, micro-imprinted, and microlens array structures with market-leading optical performance for the waveguides, Diffractive Optical Elements (DOE), and light guides used in Extended Reality, Displays, and other optoelectronic applications. With refractive indices ranging from 1.7 to 2.0 and a wide range of viscosities, PixNIL® products can be tuned to optimize each customer’s unique devices and process windows.
Enabling Next-Generation Optoelectronic Applications
PixNIL® high-refractive-index nanoimprintable products are compatible with glass and plastic substrates, commercially available stamps, and industry-standard manufacturing for a broad array of applications.
>2.0 for Titania formulations
>1.7 for Zirconia formulations
>1.7 for Zirconia formulations
10–20 nm monodisperse nanocrystals
>95% across all visible wavelengths
<0.1% haze at visible wavelengths
0.1 to 1.5 µm for solvent-containing formulations
3-15 µm for solvent-free formulations
3-15 µm for solvent-free formulations
<30 nm achievable under optimized imprint conditions
High Refractive Index
Precision Nanocrystal Control
Exceptional Transparency
Ultra-Low Haze
Tunable Film Thickness
Thin Residual Layer Control
High Refractive Index
>2.0 for Titania formulations
>1.7 for Zirconia formulations
>1.7 for Zirconia formulations
Precision Nanocrystal Control
10–20 nm monodisperse nanocrystals
Exceptional Transparency
>95% across all visible wavelengths
Ultra-Low Haze
<0.1% haze at visible wavelengths
Tunable Film Thickness
0.1 to 1.5 µm for solvent-containing formulations
3-15 µm for solvent-free formulations
3-15 µm for solvent-free formulations
Thin Residual Layer Control
<30 nm achievable under optimized imprint conditions
Advantages of PixNIL® Products
PixNIL® enabled high RI nanoimprintable products have the lowest haze and highest transparency across all visible wavelengths, delivering the highest value available on the market. These formulations are also compatible with industry-standard NIL stamps.
Explore Our PixNIL® Product Catalogue
PixNIL® SZ2-2S
Nanocrystal: PixClear Zirconia 10nm
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PixNIL® ST6
Nanocrystal: PixClear Titania 20nm
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PixNIL® ST18
Nanocrystal: PixClear Titania 20nm
...
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PixNIL® SCS3-2S
Nanocrystal: PixClear Coreshell 20nm...
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PixNIL® SZ2-2S
- Nanocrystal: PixClear Zirconia 10nm
- Solvent Type: PGMEA
- Dispensing Method: Spin Coat / Slot Die
- Refractive index: 1.72
- Percent Transparency: >95%
- Film Thickness Range: 0.5-1.5 µm
- Curing Method: UV
- Percent Haze: <0.02%
- Low shrinkage
- Excellent structural fidelity and mechanical properties
- Enables larger FOV and more immersive AR experience
Customized versions of PixNIL® Designer Composites™ available upon request
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PixNIL® ST6
- Nanocrystal: PixClear Titania 20nm
- Solvent Type: PGMEA
- Dispensing Method: Spin Coat / Slot Die
- Refractive index: 1.87
- Percent Transparency: >90%
- Film Thickness Range: 0.1-1.5 µm
- Curing Method: UV
- Percent Haze: <0.05%
- Low shrinkage
- Excellent structural fidelity and mechanical properties
- Enables larger FOV and more immersive AR experience
Customized versions of PixNIL® Designer Composites™ available upon request
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PixNIL® ST18
- Nanocrystal: PixClear Titania 20nm
- Solvent Type: PGMEA
- Dispensing Method: Spin Coat
- Refractive index: 1.92
- Percent Transparency: >99%
- Film Thickness Range: 0.1-1.5 µm
- Curing Method: UV
- Percent Haze: <0.05%
- Excellent structural fidelity and mechanical properties
- Enables larger FOV and a more immersive AR experience through index matching with HRI waveguide substrates
Customized versions of PixNIL® Designer Composites™ available upon request
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PixNIL® SCS3-2S
- Nanocrystal: PixClear Coreshell 20nm
- Solvent Type: PGMEA
- Dispensing Method: Spin Coat / Slot Die
- Refractive index: 1.8
- Percent Transparency: >90%
- Film Thickness Range: 0.1-1.5 μm
- Curing Method: UV
- Percent Haze: <0.1%
- Low shrinkage
- Excellent structural fidelity and mechanical properties
- Enables larger FOV and more immersive AR experience
Customized versions of PixNIL® Designer Composites™ available upon request
PixNIL® Processing
Pixelligent’s PixNIL® formulations can be applied using a broad range of processes including: spin coating, jet coating, and inkjet printing, followed by NIL imprinting and UV curing. Our PixNIL® formulations are also compatible with industry-standard NIL stamps.
PixNIL® Formulation Resources
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Our PixNIL® Standard Formulations and Custom Designer Composite® Manufacturing Services
Contact us for information on our PixNIL, PixJet, and Designer Composites custom manufacturing services for customized versions of our PixNIL, PixJet, and Designer Composite formulated products for your next generation nanoimprint lithography (NIL), XR, display, optoelectronic applications, and thin-film applications.
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