Product Info Sheet
Nanoimprint Lithography Formulations
Revolutionize the performance capabilities of your Extended Reality (XR) and Optical Sensor applications with Pixelligent’s PixNIL® formulations.
PixNIL® High-Index NIL Formulations
PixNIL® formulations are available in solvent-containing and solvent-free variations with a range of refractive indices and UV stability to meet a broad range of requirements. PixNIL® products deliver nanoimprinted, microimprinted, and microlens array structures with market-leading optical performance for the waveguides, Diffractive Optical Elements (DOE), and light guides used in Extended Reality, Displays, and other optoelectronic applications. With refractive indices ranging from 1.7 to 2.0 and a wide range of viscosities, PixNIL® products can be tuned to optimize each customer’s unique devices and process windows.
Enabling Next-Generation Optoelectronic Applications
PixNIL® high-refractive index nanoimprintable products are compatible with glass and plastic substrates, commercially available stamps, and industry-standard manufacturing for a broad array of applications.
>2.0 for titania formulations
>1.7 for zirconia formulations
>1.7 for zirconia formulations
10-20nm
Across all visible wavelengths >95%
<0.1%
0.1 to 1.5µm for solvent-containing formulations
3-15µm for solvent-free formulations
3-15µm for solvent-free formulations
<30nm
High RI
Particle Size
Highest Transparency
Low Haze
Film Thickness Range
Residual Layer Thickness
High RI
>2.0 for titania formulations
>1.7 for zirconia formulations
>1.7 for zirconia formulations
Particle Size
10-20nm
Highest Transparency
Across all visible wavelengths >95%
Low Haze
<0.1%
Film Thickness Range
0.1 to 1.5µm for solvent-containing formulations
3-15µm for solvent-free formulations
3-15µm for solvent-free formulations
Residual Layer Thickness
<30nm
Advantages of PixNIL® Products
PixNIL® enabled high RI nanoimprintable products have the lowest haze and highest transparency across all visible wavelengths, delivering the highest value available on the market. These formulations are also compatible with industry-standard NIL stamps.
Explore Our PixNIL® Product Catalogue
PixNIL® SZ1
Nanocrystal: PixClear Zirconia 10nm
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PixNIL® SFZ1
Nanocrystal: PixClear Zirconia 10nm
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PixNIL® ST1
Nanocrystal: PixClear Titania 20nm
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PixNIL® ST2
Nanocrystal: PixClear Titania 20nm
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PixNIL® SFT1
Nanocrystal: PixClear Titania 20nm
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PixNIL® ST5
Nanocrystal: PixClear Titania 20nm
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PixNIL® SZ1
- Nanocrystal: PixClear Zirconia 10nm
- Solvent Type: PGMEA
- Dispensing Method: Spin Coat / Slot Die
- Refractive index: 1.7
- Percent Transparency: >95%
- Film Thickness Range: 0.5-1.5 µm
- Curing Method: UV
- Percent Haze: <0.1%
- Low shrinkage
- Excellent structural fidelity and mechanical properties
- Enables larger FOV and more immersive AR experience
- Customized versions of PixNIL® Designer Composites™ available upon request
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PixNIL® SFZ1
- Nanocrystal: PixClear Zirconia 10nm
- Solvent Type: None
- Dispensing Method: Spin Coat / Slot Die
- Refractive index: 1.7
- Percent Transparency: >95%
- Film Thickness Range: 5.0-15.0 µm
- Curing Method: UV
- Percent Haze: <0.1%
- Low shrinkage
- Excellent structural fidelity and mechanical properties
- Enables larger FOV and more immersive AR experience
- Customized versions of PixNIL® Designer Composites™ available upon request
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PixNIL® ST1
- Nanocrystal: PixClear Titania 20nm
- Solvent Type: PGMEA
- Dispensing Method: Spin Coat / Slot Die
- Refractive index: 1.8
- Percent Transparency: >93%
- Film Thickness Range: 0.5-1.5 µm
- Curing Method: UV
- Percent Haze: <0.2%
- Low shrinkage
- Excellent structural fidelity and mechanical properties
- Enables larger FOV and more immersive AR experience
- Customized versions of PixNIL® Designer Composites™ available upon request
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PixNIL® ST2
- Nanocrystal: PixClear Titania 20nm
- Solvent Type: PGMEA
- Dispensing Method: Spin Coat / Slot Die
- Refractive index: 1.9
- Percent Transparency: >93%
- Film Thickness Range: 0.1-0.5 µm
- Curing Method: UV
- Percent Haze: <0.2%
- Low shrinkage
- Excellent structural fidelity and mechanical properties
- Enables larger FOV and more immersive AR experience
- Customized versions of PixNIL® Designer Composites™ available upon request
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PixNIL® SFT1
- Nanocrystal: PixClear Titania 20nm
- Solvent Type: None
- Dispensing Method: Spin Coat / Slot Die
- Refractive index: 1.9
- Percent Transparency: >93%
- Film Thickness Range: 3.0-10.0 µm
- Curing Method: UV
- Percent Haze: <0.2%
- Low shrinkage
- Excellent structural fidelity and mechanical properties
- Enables larger FOV and more immersive AR experience
- Customized versions of PixNIL® Designer Composites™ available upon request
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PixNIL® ST5
- Nanocrystal: PixClear Titania 20nm
- Solvent Type: PGMEA
- Dispensing Method: Spin Coat / Slot Die
- Refractive index: 2
- Percent Transparency: >91%
- Film Thickness Range: 0.5-1.5 µm
- Curing Method: UV
- Percent Haze: <0.1%
- Low shrinkage
- Excellent structural fidelity and mechanical properties
- Enables larger FOV and more immersive AR experience
- Customized versions of PixNIL® Designer Composites™ available upon request
PixNIL® Processing
Pixelligent’s PixNIL® formulations can be applied using a broad range of processes including: spin coating, jet coating, and inkjet printing (coming soon), followed by NIL imprinting and UV curing. Our PixNIL® formulations are also compatible with industry-standard NIL stamps.
